A thin film of TiO2 is usually deposited by spin coating. By varying the spin coating rpm, the thickness of TiO2 layer is varied. Now does the thickness of TiO2 layer which acts as a electron extractor have an impact on the efficiency of Perovskite solar cell?
Yes, thats why thickness optimization of ETL and HTL is necessary to get maximum device efficiency . Read the attached article.
The defect in film increases with thickness film. So, the electron-hole generates from phtoton are more possible to recombine and diffuse a luminescence. So, the thickness is inversly proportional with transparency.
For the solar cell, TiO2 is used as antireflecting layer in the goal to diffuse more photon in the inner of cell. As consequence, to have a transparency TiO2 film is essential to optimize the TiO2 thickness parameter.
Best regards.
Dear Shrikant,
welcome,
Adding to what has been said by the colleagues, if the TiO2 layer is compact acting as an electron transport layer it must be as thin as possible in order to reduce its resistance to the current transport in the cell.
The electron transport layer affects performance of the solar cell through its:
Resistivity, it must be as small as possible,
It thickness, it must be as thin as possible
Energy level matching with perovskite such that its conduction band edge lies under that of the perovskite to extract electrons and its valence band edge lies under the valence band edge of the perovskite to reject holes.
Best wishes
Definitely, thickness of layers (ETLs/HTLs/absorber material) will affect efficiency of Photo-voltaic devices. More the electron hole pair recombination more will be the efficiency.
Definitely it has. Thinner the TiO2 ETL compact layer, better will be the resulting performance of solar cell device. Because, the transparency will be more, much light would pass through it and reach to the absorber layer creating electron hole pairs. The series resistance is proportional to the thickness, lower the thickness lesser will be the series resistance of the device resulting higher current density. Thinner the ETL, lower will be the chances of recombination and as well as the defects or pin holes which hampers the majority carrier transport and hence the performance.
However, it is too hard to deposit very thin ETL layer (~10 or 15 nm) but it is practicable to achieve a thickness of 40 to 50 nm which will work better.
Thanks
Thank you for the responses,
however, I still want to ask what if the TiO2 is a mesoporous layer, will the thickness also be Thinner?@Abdelhalim abdelnaby Zekry
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