Dear All,
I would like to pattern the electrode on LiNbO3 plate.
now I have a mask, but I do not know what chemical can be used to etch the LiNbO3 plate
Comparing to Silicon lithography process, Are there any differences in the processes ?
Now I have 9260 photoresist
and 400K developer, can I use these two to process LiNbO3 substrate
Regards,
Yannapol S.
standard photolithography, used for Si, should be applicable to LiNbO3
Avoid hot acids as you will exchange some of the Li for H.
There should be a wealth of literature on the etch process.
Cheers,
Majeed
Normally this is done using a lift-off process, with the electrodes being evaporated onto the patterned resist, then resist stripping in acetone. If you want to use photolithography you are better off with a negative resist to get sidewall undercut. However, you will probably need a new mask if you want to go that way.
it depends on whether your application is SAW, bulk optics, or integrated optics (with surface waveguiding). If it's for bulk optics you can be relatively cavalier as indicated by Mr Foad, as the most that will happen with the processes used for metal patterning is that you remove some of the Li from the surface ouside the electrodes (the exception to this would be if you were concerned to minimise diffraction splash in the unmodulated state of a direct-plated TIR modulator - but in that case you would usually use a low-index surface coating under the electrodes).
As indicated by Chris Cork, lift-off is generally recommended for UHF SAWs and for guided-wave optics.Add your answer
You could also try an internet search using a string such as "saw linbo3 metal patterning"
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