APP (Anti-Reflective Coating Preservation) and EUV (Extreme Ultraviolet) cleaning processes are generally used in the semiconductor industry for the maintenance and cleaning of photomask surfaces and other optical components. These processes are designed to remove contaminants and particles that can degrade the performance of optical systems.
ETL (Electron Transport Layer) and HTL (Hole Transport Layer) are commonly used layers in organic electronic devices like organic light-emitting diodes (OLEDs). They play crucial roles in charge transport and energy level alignment within the device structure.
APP and EUV cleaning processes primarily focus on the removal of contaminants from the surface of optical components, and they are not specifically targeted at modifying the properties of ETL or HTL layers. Therefore, these cleaning processes are not expected to directly affect the work functions of ETL and HTL materials.
However, it's important to note that the cleaning processes, especially if they involve harsh chemicals or physical treatments, can potentially have indirect effects on the device structure or underlying layers. For example, if the cleaning process causes physical damage to the device or alters the surface morphology of the layers, it may indirectly impact the performance of the ETL and HTL layers.
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