Dear colleagues,

I am studying on MoS2 thin film. I would like to prepare MoS2 thin films by wet chemical reaction system at low temperature (< 100 degree centigrade) and ambient atmosphere. I have referenced a lot of research papers, but most of the MoS2 thin films were prepared by CVD method. Please, could you help me explain how do the temperature and ambient condition effect on the formation of MoS2 thin film? And the effect of thermal annealing [in different ambient conditions] on structural and optoelectronic properties of MoS2 thin films.

P. T. K. Loan

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