As we used to carry high temperature treatment for annealing of thin film coating, if we use liquid nitrogen or other low temperature shock for negative temperature shock can we achieve annealing?
Annealing is generally done at a temperatures lower than the melting point of the material.This helps to deliver additional energy to the atoms and they rearrange, relax and reduce the strain in the newly formed film. Such being the case I doubt whether a low temperature thermal shock can achieve the same, since in this case you are not giving any additional energy to the system.
Regards,
@ Rajeev Kumar . yes I am totally agree with you sir, but if we reduce temperature to negative axis then in place of giving energy we are removing it from the system. This will equally bring rearrangement due to thermodynamics constant. My query is related to difference obtained in both the cases.
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