Thin films of Os metal can be prepared by thermal decomposition of an Os tetroxideolefin compound (see US Patent 3573970 A). Is there any reason that thick "films," say 1 mm+, could not be prepared in the same way, either by evaporating a large volume of the Os tetroxideolefin compound, or by repeated deposition of thin films?
I am not a Chemist, nor I am expert in the sector, but Osmim tetraoxide is one of the worst known compound. So I would be extremely careful to use solid Os.
Dear Joseph Skulan ,
Thin films of Os metal can be prepared by thermal decomposition. Refer the following links.
cad4.cpac.washington.edu/ja0176705.pdf
pubs.acs.org/doi/full/10.1021/cm201795s?src=recsys
www.technology.matthey.com/pdf/pmr-v36-i1-026-033.pdf
www.google.co.in/patents/US6303809
https://www.americanelements.com/osmium-foil-7440-04-2
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