How to etch 2 um silicon dioxide (PR mask) using ICP RIE Plasmalab System 100... Any suggestions for recipe?

Hello, I am trying to etch 2 μm of PECVD SiO2 using a ~4 μm PR mask to create a pattern of 20 * 60 μm. I am using the Oxford ICP-RIE Plasmalab System 100. I have tried multiple recipes, but I have...

15 June 2023 6,030 1 View