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Questions related from Seong Jun Yoon
I am trying to deposit Cobalt film (> 100 nm) on Si/SiO2 wafer first (by sputter), do some treatment on the thick film, and etch back the Co film down to sub 10-nm thickness. Maintaining the...
06 June 2017 4,155 2 View
Let's assume a multi-layered stack of - (Bottom) Layer 1: n (@ 633 nm) = 1.21 / thickness = 60 nm (Mid) Layer 2 : n (@ 633 nm) = 1.47 / thickness = 30 nm (Top) Layer 3 : n (@ 633 nm) = 1.48 /...
11 November 2016 1,748 0 View
