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Questions related from Sandeep Srivastav
The elastomer in my sputtering target is exposed in middle of the target, can I still use it?
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I'm using ZrOCl2.8H2O (0.6 M, and 0.3 M)as a precursor and 2-ME as a solvent and I want to get uniform ZrO2 film for a single layer spin coating. However, with a single coating, I'm getting high...
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I'm using ZrOCl2.8H2O as precursor and 2-methoxyethanol as solvent and I have solutions with different-different morality, however with each of them I'm getting striations in the film. How can I...
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I have deposited zirconium film using spin coating. When I take IV characteristic using mercury probe, I'm getting leakage current around E-8 however when I deposit any metal using sputtering and...
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