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Hi, We are planning to buy a 100 kV EBL for our cleanroom. There are several companies who offer such systems and for similar spec price varies considerably. So, it a bit difficult to choose an...
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Hi, I am using a chip from a silicon substrate uniformly doped with phosphorus (~10E15 cm-3) to make devices by FIB milling. After milling I am using thermal annealing for treating the damages....
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Hi, I am trying to adopt an anisotropic silicon etch recipe to Oxford NGP80 RIE machine. The Original recipe has been optimised for a different machine (NEXTRAL 330 RIE parallel plate plasma...
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Hi, I need to realise/fabricate very high-Q photonic crystal cavities in silicon for my PhD project. The cavities should be optimised for certain wavelength range (around 1078 nm). I am trying...
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Hi, I want to transfer feature (array of holes, diameter - 140 nm) from 110nm SiO2/hard cured HSQ layer to 220 nm silicon layer of SOI wafer. I need good anisotropic etch. I am using a Oxford RIE...
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I am trying to pattern array of holes (diameter 140 nm) with 20 KeV & 20 um aperture. Shall I use curved element dose in addition to area dose? If yes, I am using area dose of 230 then what...
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