Rinat Galiev

2 Questions 7 Answers 0 Followers

Questions related from Rinat Galiev

How to remove exposured ma-N 2400 resist features without killing PMMA and copolymer MMA(8.5)MAA pattern nearby?

I want to make two step e-beam lithography process: 1) Expose and develop negative ma-N 2400 pattern firstly to make special relief, which should be embedded into the next layers. 2) Coat the...

03 March 2018 3,489 2 View

I need to temporarily decrease the topography steps from 10 um to 1-2 um on a piece of wafer

I have the wafers (small pieces ~1/4 of 2") with simple topography of 10 um in height. To make airbridge connections between some pads with spans about 15 um I need to make a kind of planarization...

05 May 2017 4,086 7 View