I am working on AZnO target, with substrate temperature @ 200. how to sustain plasma at 0.5 mTorr, 100 W by Rf sputtering?

i am using 2" AZnO target and depositing thin film using RF sputtering at 100 W and 0.5 mtorr. substrate temperature is provided at 200 C. Plasma ON/OFF at 0.5 mTorr and plasma is created around...

18 August 2018 8,161 4 View