Is silicon substrate easy to be etched during sputtering process?

I got some troubles about deposite SiNx or BN on silicon wafer. The main parameters I used was shown below: SiNx: DC current: 150/250 mA, Power is 50/80W Gas: 10/10 sccm Ar/N2, and pressure: 2.0...

09 April 2023 2,270 3 View