RIE of Al2O3 with available Ar, O2, CF4, and SF6?

I need to etch Al2O3 (15nm) on top of ZnO (50nm) without hardening the photoresist and without etching the ZnO below using the available plasma: Ar, O2, CF4, and SF6. Normal chlorine based...

16 October 2018 2,956 8 View