7 Questions 17 Answers 0 Followers
Questions related from Muhammad Reza
While using MW PECVD to deposit SiNx on Si wafers, I came across the "phase shift" setting. Based on the manual, my understanding is that if I set the phase shift at 20%, the oscillation from the...
24 August 2016 6,160 2 View
I sputtered a Ni-5.5Al (at%) target onto a glass substrate, suing DC magnetron. The thin film thickness is about 275nm. The XRD on both sputtering target (bulk) and the thin film suggest that the...
22 November 2014 9,463 8 View
Could any researchers provide links to a database of m.f.p of particles under vacuum conditions? I am trying to compare the m.f.p of Ni, Al and several other metals under vacuum in order to...
11 October 2014 2,620 6 View
Is there any correlation between the grain size of the sputtering targets towards the formation of the thin films? I came across a research by CA Michaluk (2000), stating that the rate of erosion...
11 October 2014 4,813 6 View
I sputtered NiAl targets using a DC sputtering equipment onto glass substrates to produce 2 thin film samples. Sample A : Particle size = 16 nm, Hc = 130 Oe Sample B : Particle size = 28 nm, Hc...
28 September 2014 4,639 5 View
I prepared several Ni-5.5Al thin films, then checked the magnetic properties using VSM. I expected that with increased sputtering time, the hysteresis loop would change proportionally; Ms will...
04 June 2014 1,778 7 View
The sputtered target (Ni-20Al bulk) itself is non-magnetic, as confirmed by VSM. Using DC magnetron, NiAl atoms were sputtered on glass substrates. However the thin films (2 to 10 microns) showed...
29 May 2014 7,125 13 View