4 Questions 4 Answers 0 Followers
Questions related from Md Ataul Mamun
We want to have a thin (~10 nm) conductive coating of carbon (graphite) on Si samples. While a C sputtering target is available in market, manufacturers don't spcify its (i.e., C) deposition rate...
22 June 2023 9,445 3 View
Is there any technique (such as post bake or any other treatment) through which we can improve the selectivity of ZEP 520A for Si dry etching? We use SF6+C4F8 gas for our reactive ion etching.
28 August 2020 1,847 1 View
We have an ICP-RIE system from SAMCO (model RIE-101iPH). To achieve anisotropical etching of Si we use SF6+C4F8+(Ar). However, we see the sample and the Si tray become dark after etching (may be...
08 October 2019 8,480 1 View
HI All, We have an ICPRIE system from SEMCO. Using this system how can I get anisotropic etching of c-Si/ a-Si with HSQ as a mask? For RIE the gases available are Cl2, CF4, O2, and SF6. Thanks in...
22 July 2019 1,559 3 View
