Laxmikanta Karmakar

5 Questions 4 Answers 0 Followers

Questions related from Laxmikanta Karmakar

Kröger-Vink notation of ZnO and Sn doped ZnO?

Can any body give me the Kröger-Vink notation of generation of free carriers in ZnO and Sn doped ZnO?

14 February 2019 6,387 4 View

Why deposition rate of ZnO increases with increasing the substrate temperature in RF magnetron sputtering system?

The ZnO thin films prepared at different substrate (TS =50 to 350 degree centregreat) temperature in RF magnetron sputtering system with other conditions remain same. we observed that the...

17 January 2019 4,168 5 View

What is the effect of working pressure in RF magnetic sputtering on Sn content in ITO thin films?

I want to know the change of tin (Sn) content with in ITO thin films prepared at different working pressure in RF magnetron sputtering system. Hare we used Argon gas as etchant element.

22 November 2018 8,352 3 View

What is the interaction of atomic hydrogen with crystalline silicon wafers in plasma chamber?

I want to know about the plasma mechanism at the time of plasma etching of crystalline silicon wafers with atomic hydrogen plasma etching. In ICP-PECVD system only atomic hydrogen can etched...

06 September 2017 7,383 3 View

What is the physical significance of the RMS roughness of any surface measured by AFM analyeser software?

For black silicon production which RMS roughness is better?

01 January 1970 7,013 3 View