Kim Young Hoon

9 Questions 1 Answers 0 Followers

Questions related from Kim Young Hoon

NH3/NF3/H2 Remote plasma Oxi/nit selective etching mechanism help ??

Hello, I am an Etch Engineer. I am performing etching with high T_ox/Nit selectivity using remote plasma. Etching plasma is formed using only NH3/NF3/H2. 1. I wonder if it would be advantageous...

12 July 2024 8,055 2 View

What is the effect on ions in the remote plasma structure?

The CCP type has a structure where plasma is formed at the top and only radicals come down through an ion filter. I'm curious that even if ions come down, there is no bias applied to the...

17 June 2024 6,775 1 View

As an etch process engineer, which books would be helpful for work?

Hello, I am an engineer who deals with etching processes. I'm trying to study the etching process and would like to ask which book would be good to study. I graduated from the Electronics...

06 June 2024 4,852 2 View

I want to know Bond strength and Etch mechanism?

I am asking this question because I want to make sure my understanding is correct. I'm learning about the etching process, but I'm having difficulty with bond strength and etching mechanism. I'm...

22 May 2024 2,269 1 View

Do you know How to calculate Device area of Interdigitated MSM??

Hello everyone, I'm a graduated student in university. I made Interdigitated MSM. So I want to calculate some diode factors. But different with normal vertical diode, It is lateral and...

10 April 2023 4,105 0 View

How can I make user defined material In silvaco TCAD athena??

Hello everyone I'm a student of university. I try to implant Fluorine ion into Gallium nitride. GaN exist in Atlas but it doesn't exist in Athena. So I try to define GaN material like below....

10 January 2023 6,767 1 View

How to simulate Fluorine ion implantation in silvaco??

Hello I'm a student who wants to implant Fluorine in GaN. But, Before I real process this one, I want to see the Doping Profile of Fluorine in Athena. But, there is no F ion source so I replace...

15 December 2022 325 0 View

After plasma etch, wafer surface is dirty or unstable..How can I solve??

Hello everyone, I'm a graduate student. Now I'm doing GaN etch with Cl2/BCl3 gas (ICP-RIE) with GXR601 When the etch depth is under 100nm, the surface (PR X) is clean but up to 200~300nm the...

05 October 2022 1,166 1 View

PhotoDiode Dark, Photo current Voltage difference??

I'm searching a few PiN Diode. But the I-V characteristics are quite different. I cannot understand why the photo current's lowest level is not 0V. and the reason of Shift. Thank you for answer

21 July 2022 3,636 2 View