What is the reason for the non-monotonic variation of roughness for sputtered Cu films annealed at 100, 200 and 300 degree Celsius?

I have prepared Copper thin films by magnetron sputtering and the samples have been annealed at 100, 200 and 300 degree celsius. The variation of the rms roughness and all other AFM height related...

12 June 2024 9,738 1 View