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Questions related from Bradley D Schwartz
The films can be deposited on a substrate that would enable a thickness measurement, e.g. glass, silicon, etc. I would also appreciate advice on depositing very thin metal films by thermal...
03 March 2016 4,047 16 View
I want to grow epitaxial semiconductor films on wafers heated to 700-1200C on a graphite susceptor.
10 October 2015 6,037 4 View
Using a = 1.0117 nm for cubic In2O3 and 16 atoms per unit cell, I calculate 16 x (1,0117E-7 cm)-3 = 1.55E+22 atoms/cm3. If I am doping In2O3 at 2%, the concentration would be 0.02 x 1.55E+22 =...
03 March 2015 4,147 1 View
I would like to deposit indium molybdenum oxide (IMO) by sputter deposition. What is the recommended Mo composition in the In2O3? Will DC sputtering work, or must RF be used?
01 January 1970 1,911 3 View
I want to sputter dielectric optical coatings from compound targets. I would like to know how the choice of RF diode or RF magneton sputtering could affect film properties such as deposition...
01 January 1970 6,917 3 View