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Questions related from Adithi Umamaheswara
SiC deposited on Si using PECVD and annealed using Tempress Dry furnace. I did XPS and found SiO2 peak very prominent, more so than Si and C peaks.
06 June 2013 5,553 1 View
Annealed at 800 degrees for 25min and thickness is 100nm
05 May 2013 9,440 2 View
