I am recently making 2D semiconductor materials by CVD synthesis, and I found some problems recently.
In my case, it is very easy to make dozens of products on silicon wafer, most of them are nice and thin crystals.
However, all of it disappeared recently. By using the same techniques, same parameters and same amount of precursors, the results on wafers are mostly clean surfaces, only few and small domains of crystals.
But changing the substrate to mica, the results are as good as before, we got very dense and fine crystals.
Is there any kind of problem that may cause this situation?
The first thing I would check is the cleaning of the substrates. If your films grow well on mica, it sounds like the silicon wafers do not have a good (or clean) oxide surface. Did your vendor change, or some part of the cleaning procedure? Most times when I had trouble with film adhesion or nucleation, the cleanliness of the substrate was the problem.
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