We are planning to grow high quality Cobalt films by the Plasma Assisted ALD, and would like to save some time on trying different precursors. Our first guess was CoCp2, but we heard that the quality of Co film grown with this precursor is irreproducible. Can anyone share their experience with this topic?
Sergei Sergeenkov
Cobalt silylamide and cobalt carbonyl precursors are claimed to be better.
http://www.google.com/patents/WO2014052316A1?cl=en
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Henrik Hovde Sønsteby
CoCp2 and NH3-plasma should work fine, but you also have the classic N,N'-dialkylacetamidinato cobalt + H2 process as described by Lim et al. in Nature Materials (2003).
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Barry Arkles
See the review article: Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications.
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