Currently I am working on some new organic molecules and I am getting the 3D island morphology.
My deposition conditions are as written below.
Substrate: Silicion with thermally grown SiO2
Cleaning. acetone , ethanol. pure water, OZ treatment.
Organic molecules deposition. Rate; 2A/1min. Subtrate temp Room temp-60C.
I checked the morphology by AFM images
My target is to get the 2D amorphous morphology.
I changed temp from RT- 60degre but still same morphology.
What are the other possible things I need to do?