I wanted to fabricate the device for that i wanted to make a structure on Si/SiO2 subtrate such that the structure is Mos2/hBN/WS2 hetero structure and on Ws2 one control gate (Poly-si) is there. Now i wanted to give a metal contacts to the Mos2 channel. How it is possible to give the contacts to the channel ?

If iam trying to do the by proceesing of ethcing ,in that process the channel will effected by this process.

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