Hello As a graduate student, I work on building a plasma-effect layering system. Recently, we have been able to easily produce plasma through high voltage of about 2 kV and current of 500 mA (AC) on quartz glass, but the problem is that we want to mix the amount of plasma out of the surface of the quartz glass to combine with the TEOS material.

Let's say, does anyone have enough experience in designing this case to produce silicon dioxide?

Other hand we don't have any RF power supply. please guide me

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