So far, I am fitting the XPS O 1s and In 3d5/2 data for In2O3 materials, It can be fitted by two components: In-O and In-OH bonds. So the ratio of In-O to In-OH bonds in O 1s XPS and In 3d5/2 fittings should be same? In this case, the parameters (g width and shape) with same energy separation for fitting each peaks are all same, only allowing the height of the individual components to vary. But the ratios are always different, just have the same tendency and magnitude.
Perhaps, it would be a good idea to obtain the changes in the ratios of OI/InI and OII/InII after short periods of ion sputtering ,i.e. removal of contaminants from the sample surface, decrease the hydroxide signal and increasie the oxide signal, trying to avoid chemical decomposition of the material due to ion sputtering.
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