How one can remove capping from a thin film?
I waould like to do transport measurements, without capping it seems that the magnetic layer gets oxidized and if one uses capping then how to perform transport measurements?
Can anyone suggest how to remove the capping using any methods?
Hello,
You can etch Al2O3 using Cl2-based plasmas (BCl3/Cl2, Ar/Cl2 for instance) with relatively high ion bombardment energy (few tens of eV). BCl3 would be preferred to Argon in your case due to better de-oxidization properties.
Hello,
As mentioned above, Al2O3 is easily etched in BCl3 plasma. But be cautios to leave the underlying material intact (BCl3 can etch it also). I believe this is desirable for you to remove the Al2O3 only.
We could discuss the most suitable process if you provide us with the information about the Al2O3 thickness and the material beneath it.
Both Al2O3 and MgO should be slowly etched in Ar plasma (ion milling) - may be the best option in case the cap layer is thin.
As Victor points out it verymuch depends on the layer underneath. If simple wet etching is allowed, then a weak acid solution will remove the MgO with ease. Similarly the Al2O3 can be etched with NaOH or KOH.
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