I use to exflioate 2d Semiconductor e.g. WSe2. the presence of nanoflakes Wse2 is confirmed by UV-Vis spectroscopy. But when i drop cast the dispersions on SiO2 Substrate and heat it , the contrast became poor due to solvent residue. I am not able to find any flake under optical microscope
The size of SiO2 under your sample is very important. If I can remember we use 300nm SiO2 under it and use green and yellow lights to seen it properly. You can also use contrast to seen it but need simple image processing to got it properly.
Size of SiO2 is important as explained in previous answer. Also you can try changing the heating conditions for drying.
actually the confirmation of nano flakes is confirmes by UV-Vis , and i am using 300 nm thick SiO2 . But after drop casting the disperion the contrast of the substrate changes to greenish yellowish.
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