Dear everyone,

I am trying to perform a CSV for the quantification of the additives from a of a commercial copper electroplating bath. For now I'm interested in the quantification of the brightener. I have seen that the analysis is performed using an excess of suppressor and then a linear regression is done (i.e. attached article). Someone uses the linear approximation technique (LAT) or a modified linear approximation technique (MLAT), the latter I don't understand what it consists of. Unfortunately, with this method I greatly overestimate the amount of the additive.

I have attached a graph of my results. I used a commercial bath with the following characteristics: CuSO4*5HO2 210 g/L, H2SO4 65 g/L, Cl- 100 ppm. From the technical data sheet the optimal conditions are with 6 mL/L of make up (suppressor?) and 0.3 mL/L of brightener.

Initially, I measured the virgin make-up solution (VMS) containing only the suppressor and not the brightener. The working electrode was a rotating disc electrode (RDE) in platinum with a diameter of 3 mm, the voltammetry was performed from +1.5 V to -0.25 V vs Ag/AgCl with a scan rate of 100 mV/s and a rotation speed of 2000 rpm. I integrated the anodic peak area of ​​the second scan. The measure corresponds to the blue diamond in the graph. Then I made three measurements adding 75 uL/​​L of the brightener each time (the blue dots). As you can see from the figure the linear regression does not pass through the first point. I have seen that someone subtract or divide the first point from the others for a better reproducibility but it doesn't work anyway.

Then I measured also a new solution containing 60, 135 and 210 uL/​​L of the brightener (orange dots) which it does not appear to be reproducible.

Has anyone experience with this technique or can help me understand why I can't make a correct quantification?

Thank you

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