I need to passivation on the nickel film to create a polymer structure, but in acid this is not possible, the film goes away instantly. How can passivation be achieved other than acid?
Nickel film passivation can be done without acid using a process called "thermal oxidation". This process involves heating the nickel film in air or oxygen atmosphere to form a thin oxide layer on the surface, which can protect the underlying nickel from further oxidation and corrosion.
The steps involved in thermal oxidation for nickel film passivation are as follows:
Clean the nickel film surface using a suitable solvent to remove any contaminants or residues.
Heat the nickel film in air or oxygen atmosphere to a temperature typically between 300°C and 600°C. The specific temperature and duration of the process will depend on the thickness of the nickel film and the desired properties of the passivation layer.
Allow the nickel film to cool down slowly to room temperature in the same atmosphere to avoid the formation of cracks or other defects in the oxide layer.
Rinse the passivated nickel film with distilled water to remove any residual oxidation products or debris.
This process can be performed in an oven or a furnace that is equipped with precise temperature control and gas flow management. The thickness and properties of the passivation layer can be controlled by adjusting the temperature, duration, and oxygen flow rate during the process.
Thermal oxidation is a relatively simple and low-cost method for nickel film passivation compared to acid-based methods, which often require specialized equipment and handling procedures to avoid safety hazards and environmental concerns.
Thank you for your detailed answer. Is there an article on how we should determine the film thickness, 25 nm meters, temperature and time? I would be happy if you share. Febin Cherian John
"Passivation of Nickel Thin Films on Silicon Substrates" by T.S. Sudarshan, et al. This article discusses the use of electrochemical passivation to create a protective oxide layer on nickel films, and includes information on how to determine the appropriate passivation time and temperature based on the thickness of the nickel film.
"Plasma Passivation of Nickel Thin Films for Biochemical Applications" by S. Y. Kim, et al. This article discusses the use of plasma passivation to create a passivation layer on nickel films, and includes information on how to determine the appropriate passivation time and temperature based on the thickness of the nickel film.
"Chemical Passivation of Nickel Thin Films Using a Sodium Dichromate Solution" by A. H. Patel, et al. This article discusses the use of chemical passivation to create a passivation layer on nickel films, and includes information on how to determine the appropriate passivation time and temperature based on the thickness of the nickel film.
I don't think these might be of your requirements, but kindly have a look.
Unfortunately, I could not find these publications with the title and author name you wrote. "Passivation of Nickel Thin Films on Silicon Substrates" by T.S. Sudarshan, et al. unfortunately it didn't come out when I wrote it like this. thanks..