When applying a colloidal solution of silicon dioxide by centrifugation on two different surfaces (silicon substrate and glass-ceramic substrate), with absolutely identical other parameters, I get two different results. The roughness of the substrates is the same. In this regard, the question arose of how particles of colloidal SiO2 interact with various surfaces (glass, ceramic glass, silicon, etc.)? Perhaps a different chemical or electrostatic effect is manifested? If possible, please point to books/articles where you can see this information in more detail.
A classic text on colloid science will help you. Read about van der Waals attractive forces and how they are dependent on the electronic properties of the materials (specifically, how random fluctuations in electron density determine the long-range attractive forces). This is often characterized by a parameter called the Hamaker constant. There may also be a contribution because of the density of -OH groups on the substrates and how that may influence attraction.
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