I want to see the damage created by laser using tight focusing inside sio2, for this I need to etch it or polish it up 5~10 micron. Can someone give suggestions on how to do this. FIB is one method but it is quite expensive. Is there any other inexpensive method?
Have you tried dry etching using RIE with ICP? It can etch up to 100micrometers.
You can try Chemical etching for smooth surface. However, if roughness is allowed, you can try mechanical polishing. You can contact NanoFab Center in KAIST, Daejon, South Korea. The link of NanoFab Center is given below:
http://www.nnfc.re.kr/eng/index.jsp
It is better, if you can contact with someone of KAIST.
A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad is described in:
Thomas, Evan L. H., Mandal, Soumen, Brousseau, Emmanuel Bruno Jean Paul and Williams, Oliver Aneurin
2014.
Silica based polishing of {100} and {111} single crystal diamond. Science and Technology of Advanced Materials 15 (3) , 035013.
10.1088/1468-6996/15/3/035013
Chemical mechanical polishing (CMP), a technique used in the polishing of gate dielectrics in integrated circuit (IC) fabrication, can successfully be used to polish nanocrystalline diamond (NCD) films with a rate of − 16 nm h 1 .Wet oxidation of the diamond increases the hydroxide content on the surface, facilitating the binding of silica particles within the slurry. Should an asperity on the rough pad then create a sufficient shearing force on the silica particle, the particle and attached carbon atom will be removed, polishing the surface.
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