Hi.

In my team, I'm now responsible for synthesizing a strong anionic-exchange material, which involves the task of attaching tertiary amine functional group on a poly(vinylbenzylcholride-co-divinylbenzene) base, using triethylamine (TEA) in varied volume of toluene.

I'm having trouble with the washing step, which would remove the residual TEA. I tried using HCl 2% (v/v) in acetone, but I could not control the formation of the resulting ammonium salt, which would precipitate and deposit on my synthesized material.

Please suggest me any other appropriate cleaning method. Furthermore, I'd like to ask a detection method for residual TEA, since I don't know whether scanning for its absorption peak in the 210-220 nm region is the correct way or not.

Many thanks in advance.

I can make it clearer if the descriptions are not detailed enough, so please don't hesitate to pop in your questions.

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