Dear Coleques,
Can anyone explains difference in LPM and EIS measurements.
Namely, for pasive alloy TiNi, from LPM I got Rc of 80 kOhm cm2. From the EIS the best fit is obtained with circuit Rs_(Rf|Cf)_(Qdl|(Rc_Q2)). The EIS is practically straight line with slope higher than 45 o. So n of Q2 is 0.58 near to Wrburg, Rs + Rf are 30 Ohm cm2., but Rc os only 6 kOhm cm2. So how to corelate Rc from LPM and EIS.
Thanks in advance,.
Branimir
Dear Dr. Branimir N. Grgur
I agree with you in that these techniques are perceived to yield differing values of resistance. In [1] below you can see the golden work of the Barai A et.al., they correlates that the computed resistance is strongly dependent on the timescales of the technique employed and that when timescales match, the resistances derived via different techniques align. Please have a look at more details on the article's full text. My best regards
[1]https://europepmc.org/article/pmc/5758786
Dear #Mohammed Hussein j. H. Al'Atia,
Many thanks for your kind reply,
Best regards
Branimir
Roughly, with Rp, you measure impedance at the frequency (sweep rate/twice the potential amplitude -one cycle). Thus, the impedance value at that frequency and Rp value shall match.
Many thanks @X. Ramón Nóvoa,
I already do this, perfect match
Best regards,
Branimir
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