I would like to establish growing of 1D nano wires on 2D TMDC materials (integrated system, 1D and 2D) at low-temperature chemical bath synthesis. The cruciality is nucleation of 1D structure on 2D TMDC without any seed layer (except 2D TMDC as its own). As I tried I couldn't be achieved it as what I expected. Since, I tried to grow ZnO nano rod (normal liquid phase synthesis) on TMDC layers MoS2, WS2 and MoSe2. But, results shown some spots on layer surface, assisted for ZnO NR growth which is countable spots only. I read some papers on which people said MoS2 layer favorable for 001 plane growth (001 plane favour for ZnO NR also). But, they grown vertical MoS2 on 2D MOS2 layer... I couldn't find the right paper. So, I need your valuable suggestions, assistance and comments
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