Does DI water has negative effect in wafer substrate cleaning?

Before apply photoresist I follow 6-step simple cleaning 1. Acetone 10min 2. Methanol 10min 3. IPA 10min 4. DI water rinse 5. N2 blow dry 6. Bake in 150 degree oven for 15min The substrate is...

28 October 2023 6,913 0 View