Questions for Al2O3 thin film deposited by RF megnetron sputterring

In order to deposit Al2O3 thin film on (100) Si substrate(500um)/Al(~25nm) thin film, I choose rf megnetron sputtering to achieve it. Here's my parameters: based vaccum: 2e-3Pa sputter Argon...

25 July 2017 8,280 9 View