1 Questions 2 Answers 0 Followers
Questions related from Tasneem Fatema
I did SiO2 dry etching using CHF3 (100 W RIE power, 10 mT pressure, 20 sccm CHF3 flow) at 20C. After the etch process, I noticed cracks/peeling off in multiple places of my sample (image...
19 July 2023 7,663 3 View