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Questions related from Stuart Field
We are having the opposite problem from many: Where our SU-8 is exposed it develops nicely (i.e., SU-8 remains), but where it is *not* exposed does not fully develop , leaving either a nearly...
16 December 2022 7,377 2 View
We are experimenting with SU8 2000.5 (0.5 um thick) on GaAs substrates. Quite often, the part of the resist that has *not* been exposed cannot be removed using SU-8 developer. This issue has...
10 August 2022 9,584 0 View
We are using Shipley 1813 as a mask for our process. The mill is an AJA argon ion mill running at 500 V, 56 mA. The resist seems to hold up well for a 10 minute etch, but by 40 minutes it is badly...
30 September 2019 9,398 1 View