I would be appreciate if you let me know how can I etch sputtered silicon dioxide film by RIE (SiO2 film thickness is 200nm)?

I try these two recipe: 1- CF4=45sccm, O2=10sccm, 100W power, 2- CF4=45sccm, O2=5sccm, Power=100W.

02 July 2020 8,112 0 View