How to avoid sidewall polymerization on SiO2 Buried Oxide layer in SOI substrates by using Dry etching (RIE) ?

I'm trying to etch SiO2 Buried oxide layer Isotropically using RIE with CHF3 + Oxygen plasma. I have problems to etch underneath of top silicon (Device layer) and i think it is due to...

16 November 2016 1,861 3 View