What is the reason for presence of high percentage of oxygen with the alloy prepared by RF and a DC sputtering?

I deposited an alloy for 30 minutes using the AJA Sputtering system. The alloy consists of Tantalum Carbide (TaC) doped with Cu. The Tantalum Carbide (TaC) was prepared by the RF gun and Copper...

18 March 2023 9,034 2 View