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I am working on Cu2ZnSnSe4 semiconductor thin film on glass substrate. The thickness of absorber is around 650 nm-720 nm. I roughened the back side of the substrate to suppress the effect of back...
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Is there anyone with experience on the etching process of ZnO from the Cu2ZnSnSe4 absorber layer? (the structure is: ZnO/CZTSe/ZnSe/Mo)
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