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Questions related from Muhammed Ali A.V
I have fabricated TFTs on SiO2(300nm)/Si(n++) substrate using ZnO as an active layer of thickness 10nm-30nm. For all TFTs, it shows ambipolar behavior!!!. Can anyone tell me is it the problem...
21 January 2015 8,751 11 View
I am working with Alumina & Zirconia thin films by reactive dc magnetron sputtering on silicon & soda lime glass substrates. Is it possible to use the Kubelka-Munk method from diffuse...
15 January 2015 7,168 10 View
Even after repeated scrubbing using sandpaper (high roughness), oxide layer still remains on the target (showing discontinuity on the surface of zirconium target). Is there any solution to...
18 January 2014 9,783 2 View
For example, increasing the thickness of the film causes a decrease in grain size, as a result of the increase in energy band gap. So how does the grain size depends on energy band gap?
11 April 2012 9,714 16 View