Hoang-Phuong Phan

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Questions related from Hoang-Phuong Phan

Which metals (eg. Ni, Au, Pt) can withstand TMAH 25 % at 90C? (for instance, the thickness of metal is 100 nm, and etching time is 1 hour)?

I am trying to use TMAH to under-etch single crystalline Si to form released amorphous Si structures. The width of the under-etch is approximately 10 um. However, as far as I know, TMAH also...

21 November 2016 3,267 2 View

Can we use Chromium as the mask for SiC etching using HCl Inductively Coupled Plasma?

I want to etch 300 nm SiC using ICP of HCl gas. It is possible to use thick photoresist layer such as 1 um of AZ6612 in our ICP system for SiC etching. However, I want to thin down the thickness...

05 November 2014 2,039 4 View