How to etch 380 um silicon (SiO2 mask) - ICP DRIE Plasmalab System 100... Any suggestions for recipe?

Hi all,I am trying to etch 380 um silicon (1,7 um SiO2 mask), window 400 * 500 um.I am using Oxford ICP DRIE Plasmalab System 100.I set up a recipe Bosch process but it is not working as well....

01 January 1970 10,014 2 View