How to reduce the oxygen contamination (about 13-20% by EDS) in the RF magnetron sputtered Fe and FeC films on Si substrates?

The base pressure: 1E-8 mbar; Ar gas 30sccm; The working pressure: 4.5-5E-3 mbar; Power: 100W; Substrate temperature: 27oC; 350oC

06 June 2019 4,889 11 View