Why does "Showerhead pattern" form on blank wafer after PECVD Oxide deposition?

Hello , I have a problem with showerhead pattern on wafer after depositing oxide in STS MULTIPLEX PECVD Chamber. Process Parameters; Teos:100 sccm, O2:1000 sccm Deposition Pressure : 300 mT RF...

07 December 2021 311 9 View