Could anyone please suggest me economical and best method for coating Cu2O on copper substrate ?

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Md Muhibbullah

You may just heat the copper plate on a heater in different temperature in air ambient and try to get Cu2O. It is difficult to get pure Cu2O for a deposition condition. Possibly you will get a mixer of Cu2O, CuO and Cu2O5. You may study both deposition temperature and deposition time. At higher temperature the copper oxide is been saturated with CuO. To get pure Cu2O you may anneal your mixed copper oxide in vacuum or nitrogen ambient.

I am not experienced on coating methods. You may try to deposit your sample by help of a paper. The link of the paper is as following;

http://www.google.com.bd/url?sa=t&rct=j&q=&esrc=s&source=web&cd=2&ved=0CCQQFjAB&url=http%3A%2F%2Fdownloads.hindawi.com%2Fjournals%2Fijp%2F2014%2F352156.pdf&ei=4OnZVPOBIc2vuQS194LwDw&usg=AFQjCNHEPX4pG6B9XMch-0PBy5zsHBBkPg

Richard O'Rorke

You could use oxygen plasma to grow thin-films of oxide on copper. This paper discuses the use of thermal plasma in a vacuum, but atmospheric cold plasma using oxygen as a process gas could work equally well.

http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=4936240&url=http%3A%2F%2Fieeexplore.ieee.org%2Fiel5%2F4915548%2F4936231%2F04936240.pdf%3Farnumber%3D4936240

Alok Chauhan

Thank you v, Mr. Richard O' Rorke and Dr. Md. Muhibbullah for your kind answers.

Milton Manrique

Under cotrolled oxygen atmosphere and temperature you will be able to form a Cu2O layer on metallic copper. Its thickness depends upon the time of the experiment. To find the best conditions use the minimization free energy of the Cu-O or Cu-O-H systems.